Effects Studying of Annealing to Mechanical Properties Carbon-Doped Ti-O Films Synthesized Using CO2 Gas

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Abstract:

Carbon-doped Ti-O films were deposited on steel and silicon wafer by DC reaction magnetron sputtering (R-MS) using CO2 as carbon and oxygen source. A series of films were prepared by means of changing the flow of CO2 or O2. The effects of annealing temperature ranging from 300 to 650°C on the properties of Ti-O films under vacuum were studied. X-ray diffraction (XRD) and field emission scanning electronic microscope (FESEM) were employed to analyze and observe structure and morphology of pre-or after-annealed Ti-O films. nanoindentation was used to measure nanohardness and modulus, and recovery was also calculated by the curves of load-displacement. Roughness and thickness were estimated by surface profiler. The XRD studies revealed that the doping of carbon was beneficial to the crystallization of the films. The results showed that the particle size of Ti-O films increased with the increase of annealing temperature, as-annealed carbon-doped Ti-O films have fair mechanical performance.

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January 2017

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[1] H.L. Chen, P. Luo, Z.Y. Huang, H.P. Chen, M. Chen, D.H. Chen: Diamond Relat. Mater., 2013, 38, 52-58.

Google Scholar

[2] Binh H.Q. Dang, Mahfujur Rahman, Don MacElroy, Denis P. Dowling: Surf. Coat. Technol., 2011, 205(2), S235-S240.

Google Scholar

[3] A.V. Manole, M. Dobromir, M. Gîrtan, R. Mallet, G. Rusu, D. Luca: Ceram. Int., 2013, 39, 4771-4776.

DOI: 10.1016/j.ceramint.2012.11.066

Google Scholar

[4] S.H. Nam, S.J. Cho, C.K. Jung, J.H. Boo, J. Šícha, D. Heřman, J. Musil, J. Vlček: Thin Solid Films, 2011, 519, 6944-6950.

DOI: 10.1016/j.tsf.2011.04.144

Google Scholar

[5] Y. T. Lin, C. H. Weng, F.Y. Chen: Chem. Eng. J., 2014, 248, 175-183.

Google Scholar

[6] Necmettin Kılınç, Erdem Şennik, Müge Işık: Ceram. Int., 2014, 40A, 109-115.

Google Scholar

[7] Khairul Arifah Saharudin, Srimala Sreekantan, Chin Wei Lai: Mater. Sci. Semicond. Process., 2014, 20, 1-6.

Google Scholar

[8] X.Z. Yu, Z.G. Shen: Vacuum, 2011, 85, 1026-1031.

Google Scholar

[9] Y.C. Wu, L.S. Ju: J. Alloys Compd., 2014, 604, 164-170.

Google Scholar

[10] F.R. Marciano, D.A. Lima-Oliveira, N.S. Da-Silva: J. Colloid Interface Sci., 2009, 340, 87-92.

Google Scholar

[11] Y.P. Yang, M.S. Wong: Surf. Coat. Technol., 2014, 14.

Google Scholar

[12] F. Wen, C. Zhang, D. Xie, H. Sun, Y.X. Leng: Nucl. Instrum. Methods Phys. Res., Sect. B, 2013, 307, 381-384.

Google Scholar

[13] M. Torrell, L. Cunha, R. Kabir: Mater. Lett., 2010, 64, 2624–2626.

Google Scholar

[14] M. Torrell, R. Kabir, L. Cunha, M.I. Vasilevskiy: J. Appl. Phys., 2011, 109, 074310–074319.

Google Scholar

[15] K. Wu: The Preparation and the Characteristics of Titanium oxide Films and Carbon-doped ones, Master thesis: JiNan University, (2006).

Google Scholar

[16] L.X. Xu: The preparation and properties research of Ti-O Films ', Master thesis: Southwest Jiaotong University, (2005).

Google Scholar

[17] O liver W C, Pharr G M.: Mter. Res., 1992, 7, 1564- 1583.

Google Scholar

[18] X.Y. Yong, Y.L. Song, Y. Wang: Prog. Org. Coat., 2014, 77, 1972-(1976).

Google Scholar