Indirect Preparation of Titanium Dioxide Oxidation Plating Layer as Photoelectrode Used in Dye-Sensitized Solar Cells

Jun Zhang; Ya Han Wu; Fang Xue; Meng Jun Yuan; Yan Huo; Cai Xia Yang; Na Liu; Xiu Fang Wang; Wei Guo

doi:10.4028/www.scientific.net/AMR.953-954.1095

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 953-954Indirect Preparation of Titanium Dioxide Oxidation...

Indirect Preparation of Titanium Dioxide Oxidation Plating Layer as Photoelectrode Used in Dye-Sensitized Solar Cells

Abstract:

The structural morphology, arrangement of the nanocrystalline particles, porosity factor, surface state, crystalline phase and specific area of photoelectrode film have great influence on photoelectric performance of dye sensitized solar cells (DSSCs). At present, using TiO₂ as the photoelectrode in the DSSC material has achieved very good photoelectric conversion efficiency. In this paper, the plating method is adopted to directly deposited the titanium coating on the conductive glass substrate, oxidizing the surface of titanium film, so that it is generated on the surface of titanium dioxide oxidation layer. Making it as the DSSC photoelectrode, obtained relative high photoelectric conversion efficiency.

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Periodical:

Advanced Materials Research (Volumes 953-954)

Pages:

1095-1098

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.953-954.1095

Citation:

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Online since:

June 2014

Authors:

Jun Zhang*, Ya Han Wu, Fang Xue, Meng Jun Yuan, Yan Huo, Cai Xia Yang, Na Liu, Xiu Fang Wang, Wei Guo

Keywords:

Dye-Sensitized Solar Cell, Electroplate, Photoelectrode, Solar Energy, Titanium Oxide Layer

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* - Corresponding Author

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