Interface Migration with Segregation in MoSi2-Based Lamellar Alloy Simulated by Phase-Field Method

Toshihiro Yamazaki; Yuichiro Koizumi; Akihiko Chiba; Koji Hagihara; Takayoshi Nakano; Koretaka Yuge; Kyosuke Kishida; Haruyuki Inui

doi:10.4028/www.scientific.net/AMR.922.832

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 922Interface Migration with Segregation in...

Interface Migration with Segregation in MoSi₂-Based Lamellar Alloy Simulated by Phase-Field Method

Abstract:

MoSi₂–based alloys are attracting attention as ultra-high temperature structural material for super-high efficiency gas turbine power generation systems. In this study, the effects of Cr-and Zr-addition on interface migration in MoSi₂/NbSi₂ lamellar silicide were examined by phase field simulations employing the segregation energies evaluated by the first principles calculation in addition to thermodynamic free energy in order to take into account the chemically-driven interfacial segregation. The simulation results indicate that both Cr and Zr can segregate at the lamellar interface to suppress its migration, and the Zr-addition is more effective to lower the interface migration rate than the Cr-addition owing to its higher segregation energy.

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Periodical:

Advanced Materials Research (Volume 922)

Pages:

832-837

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.922.832

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Online since:

May 2014

Authors:

Toshihiro Yamazaki*, Yuichiro Koizumi, Akihiko Chiba, Koji Hagihara, Takayoshi Nakano, Koretaka Yuge, Kyosuke Kishida, Haruyuki Inui

Keywords:

Phase Field Simulation, Refractory Material, Silicide

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