Theoretical Investigation of Adsorption of N-Containing Species at SiC(0001) Surfaces
p.599
p.599
Electrical Activation of Ion-Implanted Nitrogen and Aluminum in 4H-SiC by Excimer Laser Annealing
p.605
p.605
Surface Properties and Electrical Characteristics of Rapid Thermal Annealed 4H-SiC
p.609
p.609
Effective Normal Field Dependence of Inversion Channel Mobility in 4H-SiC MOSFETs on the (11-20) Face
p.613
p.613
Damage Relaxation Pre-Activation Anneal in Al-Implanted SiC
p.617
p.617
Electrical Characterization of Ion-Implanted n+/p 6H-SiC Diodes
p.621
p.621
High-Sensitivity Ion Beam Analytical Method for Studying Ion-Implanted SiC
p.625
p.625
SiC Delta-Doped-Layer Structures and DACFET
p.629
p.629
Annealing of a Vacancy-Type Defect and Diffusion of Implanted Boron in 6H-SiC
p.633
p.633
Damage Relaxation Pre-Activation Anneal in Al-Implanted SiC
Abstract:
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Info:
Periodical:
Materials Science Forum (Volumes 433-436)
Pages:
617-620
Citation:
Online since:
September 2003
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