Effect of Argon during Diamond Deposition by Hot Filament Chemical Vapor Deposition

Divani C. Barbosa; Ursula Andréia Mengui; Mauricio R. Baldan; Vladimir J. Trava-Airoldi; Evaldo José Corat

doi:10.4028/www.scientific.net/MSF.869.721

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HomeMaterials Science ForumMaterials Science Forum Vol. 869Effect of Argon during Diamond Deposition by Hot...

Effect of Argon during Diamond Deposition by Hot Filament Chemical Vapor Deposition

Abstract:

The effect of argon content upon the growth rate and the properties of diamond thin films grown with different grains sizes are explored. An argon-free and argon-rich gas mixture of methane and hydrogen is used in a hot filament chemical vapor deposition reactor. Characterization of the films is accomplished by scanning electron microscopy, Raman spectroscopy and high-resolution x-ray diffraction. An extensive comparison of the growth rate values and films morphologies obtained in this study with those found in the literature suggests that there are distinct common trends for microcrystalline and nanocrystalline diamond growth, despite a large variation in the gas mixture composition. Included is a discussion of the possible reasons for these observations.

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21st Brazilian Conference on Materials Science and Engineering

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Periodical:

Materials Science Forum (Volume 869)

Pages:

721-726

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.869.721

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Online since:

August 2016

Authors:

Divani C. Barbosa*, Ursula Andréia Mengui, Mauricio R. Baldan, Vladimir J. Trava-Airoldi, Evaldo José Corat

Keywords:

Argon, Diamond, Growth Rate, HFCVD

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