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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vol. 398Structural and Morphological Properties of Nano...

Structural and Morphological Properties of Nano Photonic Silicon Structure for Photonics Applications

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Abstract:

Porous silicon (n-PS) with diverse morphologies was prepared on silicon (Si) substrate via photo-electrochemical etching technique. We studies the structure, surface morphology, pore diameter, roughness, based on (XRD), (AFM), (SEM) at different etching time (5, 10 min) and current (10mA/cm²).

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Materials Engineering and Science

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Periodical:

Defect and Diffusion Forum (Volume 398)

Pages:

29-33

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.398.29

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Online since:

January 2020

Authors:

Mariam M. Hassan, Makram A. Fakhri*, Salah Aldeen Adnan

Keywords:

AFM, Photo-Electrochemical Etching, Porous Silicon, SEM, XRD

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* - Corresponding Author

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