Abstract
Theoretical investigations of the dependence of the optimal thickness of a one-layer antireflection SiO\({}_{2}\) coating on a silicon photodiode on the characteristics of the light incident to the photodiode. It is shown that the optimal thickness of the one-layer antireflection SiO\({}_{2}\) coating for different angular distributions of intensity increases the quantum efficiency of the photodiode by up to 1.1 times in comparison with the classical one-layer antireflection coating with a thickness \(\lambda/4n\), which is optimal in the case of the normal incidence of monochromatic light.
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Timofeev, A.V., Mil’shtein, A.I. & Grigor’ev, D.N. Optimization of The Thickness of Single-Layer Antireflection SiO\({}_{\mathbf{2}}\) Coating on a Silicon Photodiode Depending of the Characteristics of Incident Light. Optoelectron.Instrument.Proc. 59, 612–619 (2023). https://doi.org/10.3103/S8756699023050096
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DOI: https://doi.org/10.3103/S8756699023050096