Abstract –
We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.
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Funding
This work was financially supported by the National Agency for Research and Development under the grant no. 15.817.02.29A and partially supported by the STCU within the Grant #6222. Ed. Monaico thanks to the Alexander von Humboldt Foundation for support.
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Monaico, E., Monaico, E.I., Ursaki, V.V. et al. Electrochemical Deposition by Design of Metal Nanostructures. Surf. Engin. Appl.Electrochem. 55, 367–372 (2019). https://doi.org/10.3103/S1068375519040070
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DOI: https://doi.org/10.3103/S1068375519040070