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Mathematical Modeling of Roughness Changing of Hard Metal Coatings Obtained by Contactless Electrospark Deposition

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Abstract

Results of the roughness studies of multicomponent hard metal layers on X12 tool steel (210Cr12/1.8–2.2% C, 12%Cr) obtained by contactless local electrospark deposition using two types hard metal electrodes (WC–TaC–Co–Al2O3 and WC–(Ti, Ta, Nb)C–Co–Al2O3) are presented here. Dense, smooth, and uniform coatings with a good repeatability of properties have been obtained. The minimal and maximal values of thickness δ, of the roughness parameter Ra, and of micro hardness HV of obtained coatings are changed by altering the stratification regimes in borders: δ = 3–12 μm, Ra = 0.8–2.2 μm and HV = 8.5–18 GPa, respectively. The influence of the process parameters and the electrode composition on the roughness of the layers obtained have been studied. Mathematical-statistical models and equations describing the roughness of the coatings have been created and worked out. They enable obtaining of coatings with a predetermined roughness by controlling regime parameters. Specific ways of obtaining coatings with reduced roughness at the maximum possible thickness, as well as recommendations for their appropriate application, have also been proposed and justified. Based on the obtained regression equations and graphical dependencies, it is possible to optimize properties of the coatings and the conditions of their deposition in order to obtain maximum tribo-effect and increased performance properties of the coated surfaces for different cases of exploitation.

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Funding

The presented work is based on research funded by the Bulgarian National Science Fund of the Ministry of Education and Science under the project “Research and Development of New Wear-Resistant Coatings Using Compositional and Nano Materials.”

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Correspondence to G. D. Kostadinov, T. G. Penyashki or D. D. Radev.

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Kostadinov, G.D., Penyashki, T.G. & Radev, D.D. Mathematical Modeling of Roughness Changing of Hard Metal Coatings Obtained by Contactless Electrospark Deposition. Surf. Engin. Appl.Electrochem. 55, 522–530 (2019). https://doi.org/10.3103/S1068375519050077

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  • DOI: https://doi.org/10.3103/S1068375519050077

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