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Anodic dissolution of electrochemical chromium coatings in electrolytes for electrochemical machining: The dissolution rate and surface roughness

  • Electrical Precision Treatment of Materials
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Abstract

By the example of dissolution under conditions of controlled hydrodynamics (a rotating disk electrode), the distinctions of the surface formation after the anodic dissolution of electrolytic chromium films in electrolytes for electrochemical machining (ECM) (in chlorides and nitrates at current densities of 0.1–15 A/cm2) have been shown. The roughness of the produced surface was not considered intrinsic and correlated with the nature of the solution anion. In the chlorides, it was determined by the fracture formation due to the surface weakening and by the pitting formation, while, in nitrates, actually only by pitting formation. The influence of the current density and the surface heating at high current densities, along with the dimensions of the layers remaining after the chromium film dissolution, on the degree of the surface weakening and its roughness has been shown. The expedience of the nitrate solutions use at the high electrolyte flow rates during the electrochemical microprocessing of such surfaces has been demonstrated.

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Authors and Affiliations

  1. Shevchenko State University, ul. 25 Oktyabrya 128, Tiraspol, Pridnestrov’e, Republic of Moldova

    S. A. Silkin & A. I. Dikusar

  2. Institute of Applied Physics, Academy of Sciences of Moldova, ul. Akademiei 5, Chisinau, MD-2028, Republic of Moldova

    V. I. Petrenko & A. I. Dikusar

Authors
  1. S. A. Silkin
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  2. V. I. Petrenko
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  3. A. I. Dikusar
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Correspondence to A. I. Dikusar.

Additional information

Original Russian Text © S.A. Silkin, V.I. Petrenko, A.I. Dikusar, 2010, published in Elektronnaya Obrabotka Materialov, 2010, No. 1, pp. 4–11.

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Silkin, S.A., Petrenko, V.I. & Dikusar, A.I. Anodic dissolution of electrochemical chromium coatings in electrolytes for electrochemical machining: The dissolution rate and surface roughness. Surf. Engin. Appl.Electrochem. 46, 1–8 (2010). https://doi.org/10.3103/S1068375510010011

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  • DOI: https://doi.org/10.3103/S1068375510010011

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