Abstract
ZnO is one of the multifunctional metal oxide semiconductors suitable for use in optoelectronic devices, as an alternative to tin oxide and indium oxide. Undoped ZnO films have been prepared using simple and cost-effective spray pyrolysis technique. In this work, we present detailed analysis of the structural, morphological and optical properties of ZnO films. X-ray diffraction spectra of the films have shown that the films are polycrystalline and hexagonal wurtzite in structure. The average grain size, estimated from the (002) peak using the Scherrer formula is around 40 ± 5 nm. The average optical transmittance of undoped ZnO thin films was about 80% in the visible. The AFM analysis reveals the surface topology having highly rough nature. The enhanced extinction coefficient varies with the flow rate. The EDX spectrum registers non-stoichiometric ZnO growth with O and Zn in 28.46 and 71.56 at. %. The features of the ZnO lead to the visible light transmission and efficient charge transport.
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Gaikwad, R.S., Patil, G.R., Shelar, M.B. et al. Nanocrystalline ZnO films deposited by spray pyrolysis: Effect of gas flow rate. Int. J Self-Propag. High-Temp. Synth. 21, 178–182 (2012). https://doi.org/10.3103/S106138621203003X
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DOI: https://doi.org/10.3103/S106138621203003X