EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes

Michael Murphy; Maximilian Weires; Nitinkumar S. Upadhyay; Philip Schuler; Shaheen Hasan; Greg Denbeaux; Robert L. Brainard

doi:10.2494/photopolymer.34.81

Michael Murphy, Maximilian Weires, Nitinkumar S. Upadhyay, Philip Schuler, Shaheen Hasan, Greg Denbeaux, Robert L. Brainard

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Keywords: EUV, Photoresist, MORE, Antimony, Photomechanism, α-Bromoacetate

JOURNAL FREE ACCESS

2021 Volume 34 Issue 1 Pages 81-86

DOI https://doi.org/10.2494/photopolymer.34.81

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Abstract

We present a new class of EUV antimony carboxylate photoresists with enhanced reactivity and contrast, through the substitution of heteroatoms into the carboxylate. The lithographic performance of (C₆H₅)₃Sb(O₂CCH₂X)₂ photoresists in which X = methoxy, bromine or iodine is presented. The addition of iodine to the photoresist greatly improves dissolution contrast. Utilizing in-situ mass spectrometry, we show how the identity and degree of volatile photoproducts created during EUV exposure change with the composition of the heteroatom.

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