Abstract
We report on the numerical simulation and fabrication of a two-dimensional flat lens based on negative refraction in photonic crystals. The slab acting as a lens is made of an hole array (operating at the wavelength of 1.5 μm) etched in a InP/InGaAsP/InP semiconductor layer. We first study the key issues for the achievement of a negative refractive index taking advantage of folding of dispersion branches with main emphasis in dispersion properties rather than the opening of forbidden gaps. The diffraction and refraction regimes are analysed according to the comparison of the wave-vector with respect to the relevant dimensions of the hole array. In the second stage, we illustrate technological challenges in terms of e-beam lithography on a sub-micron scale and deep reactive ion etching for an indium phosphide based technology.
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© 2006 SEP, Warsaw
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