Science of Sintering 2024 OnLine-First Issue 00, Pages: 49-49
https://doi.org/10.2298/SOS230726049P
Full text ( 964 KB)
Modification of the Ni-NiO-oxidant system by thermo-chemical oxidation with accelerated growth of the p-type dielectric oxide layer, by the action of substituted V2O5 on the system
Purenović Jelena M. (University of Kragujevac, Faculty of Technical Sciences Čačak, Serbia)
Purenović Milovan M. (University of Niš, Faculty of Sciences and Mathematics, Serbian Academy of Inventors and Scientists, Serbia)
Nickel is covered with very thin oxide film and is stable against corrosion
under normal conditions. Nickel, as Ni-NiO-oxidant system, can make much
thicker (even a thousand times) and more corrosion unstable oxides. With
certain new oxidation process parameters, nickel can undergo so-called
accelerated oxidation. The subject and goal of this work is to find the most
favorable conditions for performing of accelerated - catastrophic Ni
oxidation process, when substitution of V2O5 is carried out into NiO (2V
(Ni)), with significant electron concentration increase and oxygen surplus.
Unlimited main and secondary charge carriers transfer is significantly
facilitated if oxide film with non-stoichiometric composition and defects is
formed. The aim is to avoid compact oxide film formation by chemical-thermal
treatments and to obtain porous and defective NiO. By using oxidized system
Ni - NiO - oxidant in glass, ceramics and evaporated metal technology,
extraordinary usable value of this work is ensured.
Keywords: catastrophic - accelerated oxidation, cation vacancy Ni□'', electron gaps ⊕, disordered defects, catalyst V2O5