2020 Volume 128 Issue 10 Pages 706-709
Among many analyzing methods for thin films, atomic force microscopy (AFM) is one of a most powerful tool which enables to analyze local properties as well as microstructure observation in nm scale, but generally it is only applied to the surface of the films and not to the cross section of the films. One of a main reason preventing the cross sectional AFM analysis will be a difficulty in preparation of a flat cross section. In the present study, the authors demonstrate a novel method for obtaining a flat cross section of stacked films deposited on substrate, i.e. perforation fracture method, where preliminary prepared pits by focused ion beam (FIB) on the film surface promote controlled crack propagation and flat cross section of the film is obtained. As a practical example, preparation of cross section and AFM observation for a BT/LNO film deposited on a Pt/Ti/SiO2/Si substrate is introduced.