Study of the electrical enhancement of direct-patternable Ag-nanostructures embedded SnO2 thin films prepared by photochemical metal-organic deposition

Hyeong-Ho PARK; Xin ZHANG; Hyuncheol KIM; Jongchul PARK; Hyung-Ho PARK; Ho Jung CHANG; Hyeongtag JEON; Ross H. HILL

doi:10.2109/jcersj2.117.608

Papers

Study of the electrical enhancement of direct-patternable Ag-nanostructures embedded SnO₂ thin films prepared by photochemical metal-organic deposition

Hyeong-Ho PARK, Xin ZHANG, Hyuncheol KIM, Jongchul PARK, Hyung-Ho PARK, Ho Jung CHANG, Hyeongtag JEON, Ross H. HILL

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Keywords: Metals, Oxides, Nanostructures, Chemical synthesis, Electrical properties

JOURNAL FREE ACCESS

2009 Volume 117 Issue 1365 Pages 608-611

DOI https://doi.org/10.2109/jcersj2.117.608

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Abstract

In this study, we characterized the optical and electric properties of direct-patternable SnO₂ films with embedded Ag nanorods/nanowires prepared by photochemical metal-organic deposition using photosensitive precursors. SnO₂ films showed a random orientation of growth independent on the presence of Ag nanorods/nanowires and annealing temperature. The values for sheet resistance and average transmittance of the SnO₂ films with and without Ag nanorods/nanowires after annealing at 600°C were 6 kΩ/square and 82.2%, and 418 kΩ/square and 87.2%, respectively. Due to the incorporation of Ag nanorods/nanowires into the SnO₂ films, the sheet resistance was remarkably improved, but the optical transmittance was slightly decreased. These results and the direct-patternability of photochemical deposition suggest that SnO₂ films with embedded Ag nanorods/nanowires could easily be used in transparent electrodes, eliminating the need for high cost processes such as dry etching.

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