| Title |
The Mechanism of Electropolishing of Niobium from Choline Chloride-based Deep Eutectic Solvents |
| Authors |
- Q.W. Chu, H. Guo, S.C. Huang, A.D. Wu, Z.M. You
IMP/CAS, Lanzhou, People’s Republic of China
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| Abstract |
The mechanism of electropolishing of niobium (Nb) from choline chloride-based deep eutectic solvent (DES) was studied by anodic polarization tests and electrochemical impedance spectroscopy (EIS) using a Nb rotating disk electrode (RDE). Based on the results of an anodic polarisation test, the electropolishing of Nb is mass transport controlled. EIS results are consistent with the compact salt film mechanism for niobium electropolishing in this electrolyte. The influence of rotation rate, applied potential and electrolyte temperature on the electropolishing mechanism of Nb was investigated. As the applied potential positively shift, Rct, Rp and L increase, CPE decrease and Rs unchanged. The increase in rotation rate and electrolyte temperature leads to a decrease of Rs, Rct, Rp and L, and an increase of CPE.
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| Funding |
National Natural Science Foundation (11705252) |
| Paper |
download THP010.PDF [0.458 MB / 5 pages] |
| Export |
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| Conference |
SRF2019 |
| Series |
International Conference on RF Superconductivity (19th) |
| Location |
Dresden, Germany |
| Date |
30 June-05 July 2019 |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editorial Board |
Peter Michel (HZDR, Dresden, Germany); André Arnold (HZDR, Dresden, Germany); Volker RW Schaa (GSI, Darmstadt, Germany) |
| Online ISBN |
978-3-95450-211-0 |
| Online ISSN |
"" |
| Received |
18 June 2019 |
| Accepted |
02 July 2019 |
| Issue Date |
14 August 2019 |
| DOI |
doi:10.18429/JACoW-SRF2019-THP010 |
| Pages |
852-856 |
| Copyright |
 Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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