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https://doi.org/10.18429/JACoW-IPAC2021-THPAB057
Title Goubau-Line Set Up for Bench Testing Impedance of In-Vacuum Undulator Components
Authors
  • P.I. Volz, S. Grimmer, M. Huck, A. Meseck
    HZB, Berlin, Germany
  • A. Meseck
    KPH, Mainz, Germany
Abstract The worldwide first in-vacuum elliptical undulator, IVUE32, is being developed at Helmholtz Zentrum Berlin. The 2.5 m long device with a period length of 3.2 cm and a minimum gap of about 7 mm is to be installed in the BESSY II storage ring. It will deliver soft X-radiation to several beamlines. The proximity of the undulator structure to the electron beam makes the device susceptible to wakefield effects which can influence beam stability. A complete understanding of its impedance characteristics is required prior to installation and operation, as unforeseen heating of components could have catastrophic consequences. Since its complex structure makes numerical calculations, such as CST simulations, at high frequency very resource intensive, bench testing the device may proof invaluable. A Goubau-line is a single wire transmission line for high frequency surface waves with a transverse electric field resembling that of a charged particle beam out to a certain radial distance. This can be used to measure the impedance of vacuum chamber components. A concept optimized for bench testing IVUE32-components will be discussed and progress towards the test bench set up will be shown.
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Conference IPAC2021
Series International Particle Accelerator Conference (12th)
Location Campinas, SP, Brazil
Date 24-28 May 2021
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Liu Lin (LNLS, Campinas, Brazil); John M. Byrd (ANL, Lemont, IL, USA); Regis Neuenschwander (LNLS, Campinas, Brazil); Renan Picoreti (LNLS, Campinas, Brazil); Volker R. W. Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-214-1
Online ISSN 2673-5490
Received 19 May 2021
Accepted 23 July 2021
Issue Date 21 August 2021
DOI doi:10.18429/JACoW-IPAC2021-THPAB057
Pages 3883-3885
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.