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https://doi.org/10.18429/JACoW-IPAC2021-FRXC06
Title Development of the Prototype of the Cavity BPM System for SHINE
Authors
  • J. Chen, Y.B. Leng, R.X. Yuan
    SSRF, Shanghai, People’s Republic of China
  • S.S. Cao
    SINAP, Shanghai, People’s Republic of China
  • L.W. Lai
    SARI-CAS, Pudong, Shanghai, People’s Republic of China
Abstract The Shanghai high repetition rate XFEL and extreme light facility (SHINE) under construction is designed as one of the most advanced FEL facilities in the world, which will produce coherent x-rays with wavelengths from 0.05 to 3 nm and maximum repetition rate of 1MHz. In order to achieve precise, stable alignment of the electron and photo beams in the undulator, the prototype of the cavity beam position monitors (CBPM) including C-band and X-band have been designed and fabricated for the SHINE. And the requirement of the transverse position resolution is better than 200 nm for a single bunch of 100 pC at the dynamic range of ±100 µm. In this paper, we present the design of the cavity with high loaded Q and the RF front-end with low noise-figure, adjustable gain, single-stage down-conversion and phase-locked with reference clock, and also described the structure and specifications of the home-made data acquisition (DAQ) system. The construction of the experiment platform and preliminary measurement result with beam at Shanghai Soft X-ray FEL facility (SXFEL) will be addressed as well.
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Conference IPAC2021
Series International Particle Accelerator Conference (12th)
Location Campinas, SP, Brazil
Date 24-28 May 2021
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Liu Lin (LNLS, Campinas, Brazil); John M. Byrd (ANL, Lemont, IL, USA); Regis Neuenschwander (LNLS, Campinas, Brazil); Renan Picoreti (LNLS, Campinas, Brazil); Volker R. W. Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-214-1
Online ISSN 2673-5490
Received 20 May 2021
Accepted 06 July 2021
Issue Date 17 August 2021
DOI doi:10.18429/JACoW-IPAC2021-FRXC06
Pages 4552-4555
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.