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The History, Physics, and Applications of the Smart-Cut® Process

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References

  1. J-P. Colinge, Silicon-on-Insulator Technology: Materials to VLSI, 2nd ed. (Kluwer Academic Publishers, Boston, Dordrecht, London, 1997).

    Google Scholar 

  2. M. Bruel, Nucl. lustrum. Methods Phys. Res. B 108 (1996) p. 313.

    Google Scholar 

  3. M. Kaminsky, IEEE Trans. Nucl. Sci. 18 (1971) p. 208.

    Google Scholar 

  4. W.K. Chu, R.H. Kastl, R.F. Lever, S. Mader, and B.J. Masters “Radiation Damage of 50-250 keV Hydrogen Ions in Silicon,” in Ion Implantation in Semiconductors 1976, edited by F. Chernow, J.A. Borders, and D.K. Brice (Plenum Press, New York and London, 1976).

    Google Scholar 

  5. J.H. Evans, J. Nucl. Mater. 68 (1977) p. 129.

    Google Scholar 

  6. M. Bruel, Electron. Lett. 31 (14) (1995) p. 1201.

    Google Scholar 

  7. L. Di Cioccio, Y. Le Tiec, F. Letertre, C. Jaussaud, and M. Bruel, ibid. 32 (12) (1996) p. 1144.

    Google Scholar 

  8. E. Jalaguier, B. Aspar, S. Pocas, J.F. Michaud, M. Zussy, A.M. Papon, and M. Bruel, ibid. 34 (4) (1998) p. 408.

    Google Scholar 

  9. M.K. Weldon, V.E. Marsico, V.J. Chabla, A. Agarwal, D.J. Eaglesham, J. Sapjeta, W.L. Brown, D.C. Jacobson, Y. Caudano, S.B. Christ-man, and E.E. Chaban, J. Vac. Sci. Technol. B 15 (4) 1997.

  10. M. Bruel, FR Patent No. 2,681,472 (October 29, 1993); U.S. Patent No. 5,374,564 (December 20, 1994).

    Google Scholar 

  11. A.J. Auberton-Hervé, J.M. Lamure, T. Barge, M. Bruel, B. Aspar, and J.L. Pelloie, Semicond. Int. 11 (1995) p. 97.

    Google Scholar 

  12. W.P. Maszara, in Proc. Fourth Int. Symp. on Silicon on Insulator Technology and Devices, edited by D.N. Schmidt, vol. 90 (Electrochemical Society, Pennington, NJ, 1990) p. 199.

  13. Q.-Y. Tong, R. Scholz, U. Gösele, T-H. Lee, L-J. Huang, Y-L. Chao, and T-Y. Tan, Appl. Phys. Lett. 72 (1) 1998 p. 49.

    Google Scholar 

  14. B. Aspar, M. Bruel, H. Moriceau, C. Maleville, T. Poumeyrol, A.M. Papon, A. Claverie, G. Benassayag, A.J. Auberton-Hervé, and T. Barge, Microelectron. Eng. 36 (1997) p. 233.

    Google Scholar 

  15. B. Aspar, C. Lagahe, H. Moriceau, A. Sou-bie, M. Bruel, A.J. Auberton-Hervé, T. Barge, and C. Maleville, in Defects and Impurities in Semiconductors, (Mater Res. Soc. Symp. Proc. 510, Pittsburgh, 1998).

  16. K.P. Hubert and G. Hezberg, Molecular Spectra and Molecular Structural Constants of Diatomic Molecules (Van Nostrand, New York, 1979).

    Google Scholar 

  17. S.J. Pearton, J.W. Corbett, and J.T. Boren-stein, Physica B170 (1991) p. 85.

    Google Scholar 

  18. A. Agarwal, T.E. Haynes, V.V. Veneziza, O.W. Holland, and D.J. Eaglesham, Appl. Phys. Lett. 72 (9) (1998) p. 1086.

    Google Scholar 

  19. B. Aspar, M. Bruel, M. Zussy, and A.M. Cartier, Electron. Lett. 32 (21) (1996) p. 1985.

    Google Scholar 

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  1. Michel Bruel
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Bruel, M. The History, Physics, and Applications of the Smart-Cut® Process. MRS Bulletin 23, 35–39 (1998). https://doi.org/10.1557/S088376940002981X

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