Skip to main content
SpringerLink
Log in

Emission spectra study of plasma enhanced chemical vapor deposition of intrinsic, n+, and p+ amorphous silicon thin films

  • Articles
  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

The PECVD intrinsic, n +, and p + a-Si:H thin film deposition processes have been studied by the optical emission spectroscope to monitor the plasma phase chemistry. Process parameters, such as the plasma power, pressure, and gas flow rate, were correlated to SiH*, Hα*, and Hβ* optical intensities. For all films, the deposition rate increases with the increase of the SiH* intensity. For the doped films, the Hα*/SiH* ratio is a critical factor affecting the resistivity. The existence of PH3 or B2H6 in the feed stream enhances the deposition rate. Changes of the free radicals intensities can be used to explain variation of film characteristics under different deposition conditions.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. J. N. Bullock and C. H. Wu, J. Appl. Phys., Vol. 69, p. 1041, 1991

    Article  CAS  Google Scholar 

  2. D. E. Carlson and C. R. Wronsky, Appl. Phys. Lett., Vol. 29, p. 602, 1976

    Article  Google Scholar 

  3. Y. Kuo, MRS Proc., Vol. 282, p. 197, 1985

    Google Scholar 

  4. Y. Kuo, Appl. Phys. Lett., Vol. 71, p. 2821, 1997

    Article  CAS  Google Scholar 

  5. F Tochikubo, A Suzuki, S Kakuta, Y Terazono and T Makabe, Appl. Phys., Vol. 68, p. 5532, 1990

    Article  CAS  Google Scholar 

  6. H. Jia, J.K. Saha, N. Ohse, and H. Shirai, J. Non-Cryst. Solids, Vol. 352, p. 896, 2006.

    Article  CAS  Google Scholar 

  7. K. Saito and M. Kondo, Phys. Status Solidi A, Vol. 207, No. 3, p. 535, 2010.

    Article  CAS  Google Scholar 

  8. S. K. Ram, L. Kroely, S. Kasouit, P. Bulkin, and P. R. Cabarrocas, Phys. Status Solidi C, Vol. 7, No. 3-4, p. 553, 2010

    CAS  Google Scholar 

  9. C. C. Tsai, R. Thompson, C. Doland, F.A. Ponce, G. B. Anderson, and B. Wacker, Mat. Res. Soc. Symp. Proc., Vol. 118, p. 49, 1988

    Article  CAS  Google Scholar 

  10. U. Kroll, J. Meier, and A. Shah, Appl. Phys., Vol. 80, p. 4971, 1996.

    Article  CAS  Google Scholar 

  11. A. Matsuda, J.J.A.P., Vol. 43, p. 7909, 2004

    CAS  Google Scholar 

  12. J. Perrin and J.P.M. Schmitt, Chemical Physics, Vol. 67, p. 167, 1982

    Article  CAS  Google Scholar 

  13. H. Yang, C. Wu, J. Huang, R. Ding, Y. Zhao, X. Geng, and S. Xiong, Thin Solid Films, Vol. 472, p. 125, 2005

    Article  CAS  Google Scholar 

  14. W. E. Spear and P. G. Le Comber, Philos. Mag., Vol. 33, p. 935, 1976.

    Article  CAS  Google Scholar 

  15. R. A. Street, Hydrogenated Amorphous Silicon, Cambridge University Press, 1992.

    Google Scholar 

  16. M. H. Brodsky, M. Cardona, and J. J. Cuomo, Phys. Rev. B, Vol. 16, p. 3556, 1997.

    Article  Google Scholar 

  17. H. Nominanda and Y. Kuo, Electrochem. Soc. Proc., Vol. 17, p. 1–9, 2002.

    Google Scholar 

  18. P. J. Hay, R. C. Boehm, J. D. Kress, R. L. Martin, Surf. Sci., Vol. 436, p. 175, 1999

    Article  CAS  Google Scholar 

  19. H. Nominanda and Y. Kuo, Electrochem. Soc. Proc., Vol. 17, p. 1–9, 2002.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Thin Film Nano &Microelectronics Research Laboratory, Texas A&M University, 77843, College Station, TX, USA

    I-Syuan Lee & Yue Kuo

Authors
  1. I-Syuan Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Yue Kuo
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Lee, IS., Kuo, Y. Emission spectra study of plasma enhanced chemical vapor deposition of intrinsic, n+, and p+ amorphous silicon thin films. MRS Online Proceedings Library 1536, 133–138 (2013). https://doi.org/10.1557/opl.2013.919

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/opl.2013.919

Search

Navigation