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Influence of size variation on the strain distribution in YSZ membranes on Si substrates

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Abstract

The oxygen conductor yttria-stabilized-zirconia (YSZ) is widely used in miniaturized solid oxide fuel cells (µSOFC) and may be suitable for solid state ion emitter applications e.g. as miniaturized ion engines for electric propulsion. Since the YSZ films are not completely free of stress during the growth, cracks in fabricated free-standing membranes are often observed.

YSZ thin films were deposited on silicon substrates by radio frequency sputtering. Free-standing YSZ membranes were fabricated by partially removing the Si substrate by anisotropic wet-chemical etching using different masking patterns defined by electron beam lithography. We show how different sizes and etching conditions influence the strain in the fabricated membranes. To characterize these membranes we used optical microscopy and scanning electron microscopy.

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Authors and Affiliations

  1. I. Physikalisches Institut, Justus-Liebig-Universität, Gießen, Germany

    Florian Kuhl, Markus Piechotka, Daniel Reppin, Torsten Henning & J. Klar Peter

  2. Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Gießen, Germany

    Juergen Janek

Authors
  1. Florian Kuhl
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  2. Markus Piechotka
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  3. Daniel Reppin
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  4. Torsten Henning
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  5. Juergen Janek
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  6. J. Klar Peter
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Kuhl, F., Piechotka, M., Reppin, D. et al. Influence of size variation on the strain distribution in YSZ membranes on Si substrates. MRS Online Proceedings Library 1495, 1214950916 (2012). https://doi.org/10.1557/opl.2013.7

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  • DOI: https://doi.org/10.1557/opl.2013.7

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