Skip to main content
Log in

Synthesis by plasma-enhanced chemical-vapor deposition and characterization of siliconlike films with hydrophobic functionalities for improved long-term geometric stability of fiber-reinforced polymers

  • Published:
Journal of Materials Research Aims and scope Submit manuscript

Abstract

Amorphous siliconlike films with hydrophobic functionalities have been deposited by plasma-enhanced chemical-vapor deposition on carbon-fiber-reinforced polymer (CFRP) unidirectional laminates used for micromechanical applications where high strength-to-weight and high stiffness-to-weight ratios are required. To improve long-term geometrical stability in ultrahigh-precision machine structures, hydrophobic CFRP materials are desirable. Three layers have been grown with different plasma-process parameters from a mixture of hexamethyldisiloxane, O2, and Ar. Chemical composition, water contact angle, surface energy, morphology, and tribological properties have been evaluated to choose the one that best fulfills hydrophobicity, wear, and scratch resistance. Wear tests have also been carried out on CFRP laminates coated with a polyurethane layer to compare the wear performance of the above specimens with that of a conventional hydrophobic coating. Scanning electron microscope images show a very good adhesion of the films to the composite substrate because the failure of the film and of the substrate (such as fiber failure) take place simultaneously.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

FIG. 1
TABLE I
FIG. 2
TABLE II
FIG. 3
FIG. 4
FIG. 5
FIG. 6
FIG. 7
FIG. 8
FIG. 9
FIG. 10
FIG. 11
FIG. 12
FIG. 13
FIG. 14

Similar content being viewed by others

References

  1. G. Lucovsky, P.D. Richard, D.V. Tsu, S.Y. Lin R.J. Markunas: Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition. J. Vac. Sci. Technol., A 4, 681 1986

    Article  CAS  Google Scholar 

  2. P.G. Pai, S.S. Chao, Y. Takagi G. Lucovsky: Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition. J. Vac. Sci. Technol., A 4, 689 1986

    Article  CAS  Google Scholar 

  3. M. Creatore, F. Palombo, R. d’Agostino P. Fayet: RF plasma deposition of SiO2-like films: Plasma phase diagnostics and gas barrier film properties optimization. Surf. Coat. Technol. 142–144, 163 2001

    Article  Google Scholar 

  4. G. Lucovsky, M.J. Maritini, J.K. Srivastava E.A. Irene: Low-temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopy. J. Vac. Sci. Technol., B 5, 530 1987

    Article  CAS  Google Scholar 

  5. Y. Kim, M.S. Hwang, H.J. Kim, J.Y. Kim Y. Lee: Infrared spectroscopy study of low-dielectric constant fluorine-incorporated and carbon-incorporated silicon oxide films. J. Appl. Phys. 90, 3367 2001

    Article  CAS  Google Scholar 

  6. A. Grill D.A. Neumayer: Structure of low-dielectric constant to extreme low-dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization. J. Appl. Phys. 94, 6697 2003

    Article  CAS  Google Scholar 

  7. A. Grill: Plasma enhanced chemical vapor deposited SiCOH dielectrics: From low-k to extreme low-k interconnect materials. J. Appl. Phys. 93, 6697 2003

    Article  Google Scholar 

  8. Y.S. Mor, T.C. Chang, P.T. Liu, T.M. Tsai, C.W. Chen, S.T. Yan, C.J. Chu, W.F. Wu, F.M. Pan, W. Lur S.M. Sze: Effective repair to ultra-low-k dielectric material (k ∼ 2.0) by hehamethyldisilazane treatment. J. Vac. Sci. Technol., B 20, 1334 2002

    Article  CAS  Google Scholar 

  9. D.K. Owens R.C. Wendt: Estimation of the surface free energy of polymers. J. Appl. Polym. Sci. 13, 1741 1969

    Article  CAS  Google Scholar 

  10. A. Cremona, L. La Guardia, E. Vassallo, G. Ambrosone, U. Coscia, F. Orsini G. Poletti: Optical and structural properties of siliconlike films prepared by plasma-enhanced chemical-vapor deposition. J. Appl. Phys. 97, 023533 2005

    Article  Google Scholar 

  11. H.R. Le, M.P.F. Sutcliffe J.A. Williams: Friction and material transfer in micro-scale sliding contact between aluminium alloy and steel. Tribol. Lett. 18, 99 2005

    Article  CAS  Google Scholar 

Download references

Acknowledgments

We thank Mr. Feiyang and Professor J. Williams of the Cambridge University Engineering Department for their assistance in the tribometer tests.

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to A. Cremona.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Cremona, A., Vassallo, E., Merlo, A. et al. Synthesis by plasma-enhanced chemical-vapor deposition and characterization of siliconlike films with hydrophobic functionalities for improved long-term geometric stability of fiber-reinforced polymers. Journal of Materials Research 23, 1042–1050 (2008). https://doi.org/10.1557/jmr.2008.0123

Download citation

  • Received:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/jmr.2008.0123

Navigation