Abstract
The epitaxial PbTiO3 thin films of different thickness were prepared on MgO(001) substrates by the reactive direct-current magnetron sputtering. The volume fraction of c domains, α, which was measured by x-ray diffractometry, increased rapidly from zero with the film thickness, being saturated at about 90% above 100 nm. The films were annealed in a PbO atmosphere at 700 °C for 8 h, and they were used to study the composition change in the Pb/(Pb + Ti) ratio and the relaxation of the residual intrinsic stress. The relationship between change of α and composition was weak. The stress state was calculated through the finite-element method. As for the small thickness, the tensile epitaxial stress overwhelmed compressive intrinsic and thermal stresses, and the domain structure was a-domain oriented. As for the large thickness, the compressive intrinsic stress together with the thermal stress overcame the tensile epitaxial stress, and the population turned into c domain.
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Choi, W.K., Choi, S.K. & Lee, H.M. Relationship between domain structure and film thickness in epitaxial PbTiO3 films deposited on MgO(001) by reactive sputtering. Journal of Materials Research 14, 4677–4684 (1999). https://doi.org/10.1557/JMR.1999.0633
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DOI: https://doi.org/10.1557/JMR.1999.0633