Abstract
The present work reports on the study of III-V gas phase reactivity in constrained gas pulse expansions of trimethylgallium (TMGa) and oxygen derivative compounds (H2O, CH3OH, O(CH3)2) with and without ammonia. The precursors are introduced separately into a high vacuum chamber via a multipulsed gas nozzle assembly. The gas mixtures are then exposed to a UV pulse from an ArF excimer laser (λ=193 nm) and the products are mass analyzed with a quadrupole mass spectrometer. The efficient laser-assisted growth of Ga-O-containing clusters in the form of [(CH3)2GaOR] x, where R is H or CH3, has been revealed. Different behavior can be seen in the reaction of TMG and the oxygen species depending on the presence of H atoms bonded to the oxygen. Significant influence of NH3 on cluster formation and oxygen incorporation is demonstrated.
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Demchuk, A., Lynch, M., Simpson, S. et al. Low Temperature Laser-Assisted Gas Phase Reactivity of TMGa with NH3 and Oxygen-Containing Compounds (H2O, CH3OH, O(CH3)2) in Constrained Pulsed Expansions. MRS Online Proceedings Library 743, 37 (2002). https://doi.org/10.1557/PROC-743-L3.7
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DOI: https://doi.org/10.1557/PROC-743-L3.7