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The Effects of Cu on Field Aided Lateral Crystallization (FALC) of Amorphous Silicon (a-Si) Films

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Abstract

A novel concept of field aided lateral crystallization (FALC) and the effects of Cu on FALC of amorphous silicon (a-Si) were investigated. Cu was found to induce the lateral crystallization toward a metal-free region as well as the crystallization of a-Si in contact with Cu. In particular, the lateral crystallization caused by Cu was noticeably accelerated at the negative electrode side in every pattern with an aid of electric field, while it was retarded at the positive electrode side. The occurrence of Cu-FALC phenomenon was interpreted in terms of dominant diffusing species (DDS) in the reaction between metal and Si.

The FALC velocity increased with the applied field intensity and the annealing temperature. The crystallization of a-Si was achieved at temperatures as low as 375°C when the annealing time increased in the presence of high electric field, above 30V/cm. Therefore, we could demonstrate the possibility of low temperature (<500°C) polycrystalline silicon (poly-Si) crystallization using Cu as a mediator in FALC technology.

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References

  1. R. S. Wagner and W. C. Ellis, Appl. Phys. Lett. 4, 89 (1964)

    Article  CAS  Google Scholar 

  2. S. W. Lee, Y. C. Jeon and S. K. Joo, Appl. Phys. Lett. 66, 1671 (1995)

    Article  CAS  Google Scholar 

  3. S. W. Lee and S. K. Joo, IEEE Electron Device Lett. 17, 160 (1996)

    Article  CAS  Google Scholar 

  4. C. Hayzelden and J. L. L. Bastone, J. Appl. Phys. 73, 8279 (1993)

    Article  CAS  Google Scholar 

  5. S. H. Park, S. I. Jun, K. S. Song, C. K. Kim and D. K. Choi, Jpn. J. Appl. Phys. 38, L108 (1999)

    Article  CAS  Google Scholar 

  6. K. S. Song, J. B. Lee, S. I. Jun, D. K. Choi and S. K. Park, J. Mat. Sci. Lett. 18, 1209 (1999)

    Article  CAS  Google Scholar 

  7. S. I. Jun, Y. H. Yang, J. B. Lee and D. K. Choi, Appl. Phys. Lett. 75, 2235 (1999)

    Article  CAS  Google Scholar 

  8. C. J. Lee, J. B. Lee, Y. C. Chung and D. K. Choi, Jpn. J. Appl. Phys. 39, 6191 (2000)

    Article  CAS  Google Scholar 

  9. S. W. Russell, J. Li and J. W. Mayer, J. Appl. Phys. 70, 5153 (1991)

    Article  CAS  Google Scholar 

  10. L. Stolt and F. M. D’Heurle, Thin Solid Films 189, 269 (1990)

    Article  CAS  Google Scholar 

  11. W. K. Chu, S. S. Lau, J. W. Mayer, H. Muller and K. N. Tu, Thin Solid Films 28, 393 (1982)

    Google Scholar 

  12. F. d’Heurle, S. Petersson, L. Stolt and B. Stritzker, J. Appl. Phys. 53, 5678 (1982)

    Article  Google Scholar 

  13. C. D. Lien, M. A. Nicolet and C. S. Pai, J. Appl. Phys. 57, 224 (1985)

    Article  CAS  Google Scholar 

  14. K. Nakashima, M. Iwami and A. Hiraki, Thin Solid Films 25, 423 (1975)

    Article  CAS  Google Scholar 

  15. I. E. Price and I. A. Berthoud, Solid State Electron. 16, 1303 (1973)

    Article  CAS  Google Scholar 

  16. K. Affolter, X. A. Zhao and M. A. Nicolet, J. Appl. Phys. 58, 3087 (1985)

    Article  CAS  Google Scholar 

Download references

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Authors and Affiliations

  1. Department of Ceramic Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-ku, Seoul, 133-791, Korea

    Jae-Bok Lee, Chul-Ho Kim, Se-Youl Kwon & Duck-Kyun Choi

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  1. Jae-Bok Lee
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  2. Chul-Ho Kim
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  3. Se-Youl Kwon
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  4. Duck-Kyun Choi
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Lee, JB., Kim, CH., Kwon, SY. et al. The Effects of Cu on Field Aided Lateral Crystallization (FALC) of Amorphous Silicon (a-Si) Films. MRS Online Proceedings Library 664, 68 (2000). https://doi.org/10.1557/PROC-664-A6.8

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  • DOI: https://doi.org/10.1557/PROC-664-A6.8

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