Abstract
The dependence of the characteristic and bremsstrahlung X-ray counts, the peak to background (P/B) ratio and the spatial resolution on the incident beam energy between 100 keV and 400 keV were measured using a high voltage electron microscope (HVEM). The bremsstrahlung count decreases much faster than that of the characteristic count with the increase of the incident beam energy. The decrease rate depends on Z number. It is ascertained that the P/B ratio and the spatial resolution at 400 keV were 2 or 3 and 2.5 times better than those at 100 keV, respectively.
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Suzuki, S., Honda, T. & Bando, Y. Some Advantages of EDS Analysis in a 400 KV Electron Microscope. MRS Online Proceedings Library 62, 123–128 (1985). https://doi.org/10.1557/PROC-62-123
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DOI: https://doi.org/10.1557/PROC-62-123