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Ultra Shallow Junction Formation by B+/BF2+ Implantation at Energy of 0.5 KEV

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Abstract

This paper describes ultra shallow junction formation using 0.5 keV B+/BF2+ implantation, which has the advantage of a reduced channeling tail and no transient enhanced diffusion. In the case of l × 1014 cm-2, 0.5 keV BF2 implantation a junction depth of 19 nm is achieved after RTA at 950°C.

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References

  1. K. Goto, J. Matsuo, T. Sugii, H. Minakata, I. Yamada, and T. Hisatsugu, IEDM Tech. Dig, (1996)

    Google Scholar 

  2. H. Kujirai, E. Murakami, and S. Kimura, Ext. Abstracts of the 1995 Int. Conf. on SSDM, (1995) pp.363–365

    Google Scholar 

  3. M. A. Foad, J.G. England, S. Moffatt, and D. G. Armour, Proc. 11th Int. Conf. on Ion Implantation Technology, (1996) pp. 603–606

    Google Scholar 

  4. W. L. Harrington, C. W. Magee, M. Pawlik, D. F. Downey, C. M. Osbum, and S. B. Felch, Proc. 4th Int. Workshop on Measurement, Characterization and Modeling of Ultrashallow Doping Profiles in Semiconductor, (1997) pp 7.1–7.11

    Google Scholar 

  5. M. Kase and H. Mori, Mat. Res. Soc. Symp. Proc., 396, (1996) pp. 757

    Article  CAS  Google Scholar 

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Authors and Affiliations

  1. Fujitsu Limited, 1500 Mizono, Tado-cho, Kuwana-gun, Mie, 511-0192, Japan

    M. Kase, Y. Kikuchi, H. Niwa & T. Kimura

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  1. M. Kase
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  2. Y. Kikuchi
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  3. H. Niwa
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  4. T. Kimura
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Kase, M., Kikuchi, Y., Niwa, H. et al. Ultra Shallow Junction Formation by B+/BF2+ Implantation at Energy of 0.5 KEV. MRS Online Proceedings Library 532, 13–16 (1998). https://doi.org/10.1557/PROC-532-13

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  • DOI: https://doi.org/10.1557/PROC-532-13

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