Skip to main content
SpringerLink
Log in

The Initial Stages of Metal Deposition on Metal and Semiconductor Electrodes Studied by in Situ STM

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

The deposition of Cu onto Au(100) and of Pb onto n- Si(111) electrodes from aqueous solutions has been monitored in situ by scanning tunneling microscopy. In the first case, a bcc structure of the Cu overlayer is observed, which allows pseudomorphic growth on Au(100) up to the 10th layer. Then a slow structural transition to fee begins. In contrast, Pb on Si(111) is shown to deposit as 3D crystallites with flat (111) terminated surfaces.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. D.M. Kolb, Schering Lectures Publication Vol. 2. (Schering Research Foundation, Berlin (1991) P1

    Google Scholar 

  2. E. Budevski, G. Staikov and W.J. Lorenz, Electrochemical Phase Formation and Growth. (VCH, Weinheim, 1996)

    Book  Google Scholar 

  3. M.F. Toney, J.N. Howard, J. Richer, G.L. Borges, J.G. Gordon, O.R. Melroy, D. Yee and L.B. Sorensen, Phys. Rev. Lett., 75 (1995) 4472

    Article  CAS  Google Scholar 

  4. N. Batina, T. Will and D.M. Kolb, Faraday Discuss., 94 (1992) 93

    Article  CAS  Google Scholar 

  5. W. Obretenov, U. Schmidt, W.J. Lorenz, G. Staikov, E. Budevski, D. Carnal, U. Müller, H. Siegenthaler and E. Schmidt, J. Electrochem. Soc, 140 (1993) 692

    Article  CAS  Google Scholar 

  6. T. Will, M. Dietterle and D.M. Kolb, in Nanoscale Probes of the Solid/Liquid Interface Vol. E 288, edited by A.A. Gewirth and H. Siegenthaler (NATO-ASI, Kluwer, Dordrecht, 1995), p. 137

    Article  CAS  Google Scholar 

  7. R. Reineke and R. Memming, Surf. Sci., 192 (1987) 66

    Article  CAS  Google Scholar 

  8. P. Allongue and E. Souteyrand, J. Vac. Sci. Technol. B5 (1987) 1644

    Article  Google Scholar 

  9. A. Heller, D.E. Aspnes, J.D. Porter, T.T. Sheng and R.G. Vadimsky, J. Phys. Chem., 89 (1985)4444

    Article  CAS  Google Scholar 

  10. M. Szklarczyk and J.O.’M. Bockris, J. Am. Chem. Soc, 88 (1984) 1808

    CAS  Google Scholar 

  11. T. Kobayashi, Y. Tanigushi, M. Yoneyama and H. Tamura, J. Phys. Chem., 87 (1983) 768

    Article  CAS  Google Scholar 

  12. M.M. Kühne and J. Schefold, Ber. Bunsenges. Phys. Chem., 92 (1988) 1430

    Article  Google Scholar 

  13. P. Allongue, E. Souteyrand and L. Allemand, J. Electrochem. Soc, 136 (1989) 1027

    Article  CAS  Google Scholar 

  14. P. Allongue and E. Souteyrand, J. Electroanal. Chem., 286 (1990) 217

    Article  CAS  Google Scholar 

  15. P. Allongue and E. Souteyrand, J. Electroanal. Chem., 362 (1993) 79

    Article  CAS  Google Scholar 

  16. P. Allongue, E. Souteyrand and L. Allemand, J. Electroanal. Chem., 362 (1993) 89

    Article  CAS  Google Scholar 

  17. P. Bindra, H. Gerischer and D.M. Kolb, J. Electrochem. Soc, 124 (1977) 1012

    Article  CAS  Google Scholar 

  18. V.A. Burrows, Y.J. Chabal, G.S. Higashi, K. Raghavachari and S.B. Christman, Appl. Phys. Lett., 53 (1988) 998

    Article  CAS  Google Scholar 

  19. Y.J. Chabal, G.S. Higashi, K. Raghavachari and V.A. Burrows, J. Vac. Sci. Technol. A7 (1989) 2104

    Article  Google Scholar 

  20. G.S. Higashi, Y.J. Chabal, G.W. Trucks and K. Raghavachari, Appl. Phys. Lett., 56 (1990) 656

    Article  CAS  Google Scholar 

  21. G.S. Higashi, R.S. Becker, Y.J. Chabal and A.J. Becker, Appl. Phys. Lett., 58 (1991) 1656

    Article  CAS  Google Scholar 

  22. H.E. Hessel, A. Feltz, M. Reiter, U. Memmert and R.J. Behm, Chem. Phys. Lett., 186 (1991) 275

    Article  CAS  Google Scholar 

  23. W. Kern and D.A. Puotinen, RCA Review, 31 (1970) 187

    CAS  Google Scholar 

  24. D.M. Kolb, in Advances in Electrochemistry and Electrochem. Engineering Vol. 11, edited by H. Genscher and Ch.W. Tobias (Wiley, New York, 1978), p. 125

    CAS  Google Scholar 

  25. M. Dietterle, T. Will and D.M. Kolb, Surf. Sci., 342 (1995) 29

    Article  CAS  Google Scholar 

  26. M. Dietterle, T. Will and D.M. Kolb, in preparation

  27. J.R. Chelikowsky and M.Y. Chou, Phys. Rev. B, 38 (1988) 7966

    Article  CAS  Google Scholar 

  28. O.M. Magnussen, J. Hotlos, R.J. Behm, N. Batina and D.M. Kolb, Surf. Sci., 296 (1993) 310

    Article  CAS  Google Scholar 

  29. A.S. Dakkouri, Sol. State Ion., in press

  30. P. Allongue, in Advances in Electrochemical Science and Engineering Vol. 4, edited by H. Gerischer and C.W. Tobias (VCH Publishers Inc., New York, 1995) pp. 1–66

    Article  CAS  Google Scholar 

  31. E. Tornita, N. Matsuda and K. Itaya, J. Vac. Sci. Technol. A8 (1990) 534

    Google Scholar 

  32. G.J. Pietsch, U. Köhler and M. Henzler, J. Appl. Phys., 73 (1993) 4797

    Article  CAS  Google Scholar 

  33. J.-N. Chazalviel, Surf. Sci., 88 (1979) 204

    Article  CAS  Google Scholar 

  34. G. Schlichthörl and L.M. Peter, J. Electrochem. Soc., 141 (1994) L171

    Article  Google Scholar 

  35. J.-N. Chazalviel, in Porous Silicon Science and Technology, edited by J.-C. Vial and J. Derien (Springer-Verlag, Berlin, 1995) pp. 17–32; and references therein

  36. U. Stimming, R. Vogel, D.M. Kolb and T. Will, J. Power Sources, 43 (1993) 169

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Dept. of Electrochemistry, University of Ulm, 89069, Ulm, Germany

    D. M. Kolb, R. J. Randler, R. I. Wielgosz & J. C. Ziegler

Authors
  1. D. M. Kolb
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. R. J. Randler
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. R. I. Wielgosz
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. J. C. Ziegler
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Kolb, D.M., Randler, R.J., Wielgosz, R.I. et al. The Initial Stages of Metal Deposition on Metal and Semiconductor Electrodes Studied by in Situ STM. MRS Online Proceedings Library 451, 19–30 (1996). https://doi.org/10.1557/PROC-451-19

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/PROC-451-19

Search

Navigation