Skip to main content
SpringerLink
Log in

In-Situ Dual-Wavelength Ellipsometry and Light Scattering Monitoring of Si/Si1-xGex Heterostructures and Multi-Quantum Wells

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

In-situ dual-wavelength ellipsometry and laser light scattering have been used to monitor growth of Si/Si1-xGex heterojunction bipolar transistor and multi-quantum well (MQW) structures. The growth rate of B-doped Si0.8 Ge0.2 has been shown to be linear, but that of As-doped Si is non-linear, decreasing with time. Refractive index data have been obtained at the growth temperature for x = 0.15, 0.20, 0.25. Interface regions ~ 6–20Å thickness have been detected at hetero-interfaces and during interrupted alloy growth. Period-to-period repeatability of MQW structures has been shown to be ±1ML.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. C. Pickering, in Handbook of Crystal Growth 3B. edited by D. T. J. Hurle (North Holland, Amsterdam, 1994) (in press).

  2. C. Pickering, Thin Solid Films, 206, 275 (1991).

    Article  CAS  Google Scholar 

  3. C. Pickering, R. T. Carline, D. J. Robbins, W. Y. Leong, D. E. Gray and R. Greef, Thin Solid Films, 223, 126 (1993).

    Article  Google Scholar 

  4. D. J. Robbins, J. L Glasper, A. G. Cullis and W. Y. Leong, J. Appl. Phys, 69, 3719 (1991).

    Article  Google Scholar 

  5. J. A. Woollam Co., 650 J St., Lincoln, NE 68508, USA.

  6. A. J. Pidduck, D. J. Robbins, A. G. Cullis, W. Y. Leong and A. D. Pitt, Thin Solid Films, 222, 98 (1993).

    Google Scholar 

  7. N. Ohtani, S. M. Mokier, M. H. Xie, J. Zhang and B. A. Joyce, Surf. Sci. 284, 305 (1993).

    Article  CAS  Google Scholar 

  8. J. L. Glasper (unpublished work).

  9. J. Humlicek and M. Garriga, Appl. Phys. A, (1993) (in press).

    Google Scholar 

Download references

Acknowledgments

The authors would like to thank J. L. Glasper for SIMS measurements. This work is supported in part by ESPRIT Project 6135 “MIDAS”.

Author information

Authors and Affiliations

  1. Defence Research Agency, St Andrews Road, Malvern, Worcs, WR14 3PS, UK

    C. Pickering, D. A. O. Hope, W. Y. Leong & D. J. Robbins

  2. Dept of Chemistry, University of Southampton, Southampton, S09 5NH, UK

    R. Greef

Authors
  1. C. Pickering
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. D. A. O. Hope
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. W. Y. Leong
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. D. J. Robbins
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. R. Greef
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Pickering, C., Hope, D.A.O., Leong, W.Y. et al. In-Situ Dual-Wavelength Ellipsometry and Light Scattering Monitoring of Si/Si1-xGex Heterostructures and Multi-Quantum Wells. MRS Online Proceedings Library 324, 53–58 (1993). https://doi.org/10.1557/PROC-324-53

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/PROC-324-53

Search

Navigation