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Kinetics of Ni Silicides Synthesis with Excimer Laser Pulses Studied by Trr

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Abstract

Time resolved reflectivity curves (TRR) in combination with non-equilibrium thermal model are used to estimate the temperature interval of chemical reactions in the systems Ni-Si (100) and Ni-SiO2-Si (100) for a ~ 500 nm thick Ni layer depending on the pulse energy density ranging from 0.5 J/cm2 to 1.0 J/cm2. Numerical simulations are performed to calculate the temperature field within the system and to analyze the reactivity of the system.

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Acknowledgments

This paper is based upon work supported by the Grant Agency of Czech Republic, under grant # 202/93/2383.

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Authors and Affiliations

  1. Department of Physics, Faculty of Civil Engineering, Czech Technical University, Thákurova 7, 166 29, Prague 6, Czech Republic

    R. Černý

  2. Mathematical Institute, Czech Academy of Sciences, Žitná 25, 115 67, Prague 1, Czech Republic

    P. Přikryl

  3. Institute of Physics, Czech Academy of Sciences, Cukrovarnická 10, 162 00, Prague 6, Czech Republic

    K.M.A. El-Kader & V. Cháb

  4. The Heyrovský Institute of Physical Chemistry and Electrochemistry, Dolejškova 3, 182 23, Prague 8, Czech Republic

    P. Engst & P. Kubát

Authors
  1. R. Černý
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  2. P. Přikryl
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  3. K.M.A. El-Kader
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  4. P. Engst
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  5. P. Kubát
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  6. V. Cháb
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Černý, R., Přikryl, P., El-Kader, K. et al. Kinetics of Ni Silicides Synthesis with Excimer Laser Pulses Studied by Trr. MRS Online Proceedings Library 320, 415–420 (1993). https://doi.org/10.1557/PROC-320-415

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  • DOI: https://doi.org/10.1557/PROC-320-415

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