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Composition and Chemical Structure of Nitrided Silica Gel

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Abstract

Sol/gel derived silica thin films were thermally treated in NH3 for four hours at temperatures up to 1300C. The films were analyzed by ellipsometry, X-ray photoelectron spectroscopy (XPS) and infrared spectroscopy (IR). Over 30 mol% nitrogen was incorporated in the film treated at 1300C. Using IR and XPS analyses,–NHx groups were found to be present after low temperature treatments, while nitrogen was incorporated in an oxynitride structure after the higher temperature treatments.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, The Pennyslvania State University, University Park, PA, 16802, USA

    R. K. Brow & C. G. Pantano

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  1. R. K. Brow
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  2. C. G. Pantano
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Brow, R.K., Pantano, C.G. Composition and Chemical Structure of Nitrided Silica Gel. MRS Online Proceedings Library 32, 361 (1984). https://doi.org/10.1557/PROC-32-361

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  • DOI: https://doi.org/10.1557/PROC-32-361

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