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Chemical Vapor Deposition of Lead-Titanate

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Abstract

Thin films of lead-titanate were deposited by chemical vapor deposition (CVD) using tetraethyl lead and titanium isopropoxide. Good high frequency hysteresis curves were obtained with platinum contacts. Low resistance of the material (estimated at 108 ohm-cm) affected low frequency measurements.

Optimized experimental parameters (pressure, temperature, gas flows, oxidizer) were derived from a designed experimental matrix using response surface methodology. This approach significantly reduced the number of deposition trials required.

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Acknowledgements

This work was supponed by the United States Government through a subcontract to Charles Stark Draper Labonllory (CSDL). The authors would like to thank Anthony Marques of CSDL for EDS and SEM analysis, and Professor M. Horenslein of Boston University for improvements in our circuit to measure the hysteresis curve.

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Authors and Affiliations

  1. Spire Corporation, One Patriots Park, Bedford, MA, 01730-2396, USA

    Anton C. Greenwald, James T. Daly & Nader M. Kalkhoran

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  1. Anton C. Greenwald
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  2. James T. Daly
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  3. Nader M. Kalkhoran
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Greenwald, A.C., Daly, J.T. & Kalkhoran, N.M. Chemical Vapor Deposition of Lead-Titanate. MRS Online Proceedings Library 243, 229–234 (1991). https://doi.org/10.1557/PROC-243-229

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  • DOI: https://doi.org/10.1557/PROC-243-229

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