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Photo-induced Deposition of Nanostructured Thin Films by UV-exposure of Heteroleptic Ti-alkoxide Solutions

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Abstract

Photodeposited physical relief structures have been formed via the UV-irradiation of solutions of the heteroleptic titanium alkoxide, (OPy)2Ti(TAP)2. Raman studies of the films produced confirm the photoinitiation of hydrolysis and condensation reactions in the molecular structure, leading to the development of an insoluble solid phase. Using a shadow mask technique, these films were deposited directly from solution with microscale patterning and their structure and properties were studied as a function of both irradiation conditions (UV-fluence and intensity) as well as precursor solution chemistry (water content). Variations in nanostructure are visible in scanning electron micrographs, with a higher solution water content producing a more condensed, i.e. less porous, film.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, University of Arizona, Tucson, AZ, 85712, USA

    J. David Musgraves & B. G. Potter Jr.

  2. Advanced Materials Laboratory, Sandia National Laboratories, Albuquerque, NM, 87185, USA

    Timothy J. Boyle

Authors
  1. J. David Musgraves
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  2. B. G. Potter Jr.
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  3. Timothy J. Boyle
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Musgraves, J.D., Potter, B.G. & Boyle, T.J. Photo-induced Deposition of Nanostructured Thin Films by UV-exposure of Heteroleptic Ti-alkoxide Solutions. MRS Online Proceedings Library 1074, 10740313 (2008). https://doi.org/10.1557/PROC-1074-I03-13

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  • DOI: https://doi.org/10.1557/PROC-1074-I03-13

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