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Nanoelectrode Lithography

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Abstract

Nanoelectrode lithography is a pattern duplication method which combine template and electrochemical reaction. With the nanoelectrode lithography, electrochemical reaction occurs along with the conductive area of the template, and oxide pattern can be directly fabricated on a surface of semiconductor or metal layer. This “Resist-less patterning” method may have advantage for precise patterning in the future.

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Authors and Affiliations

  1. NTT Basic Research Laboratories, NTT Corporation, 3-1, Morinosato Wakamiya, 243-0198, Atsugi-Shi, Japan

    Atsushi Yokoo

  2. NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, 243-0198, Atsugi-shi, Japan

    Hideo Namatsu

  3. NTT-AT Nanofabrication Corporation, 3-1, Morinosato Wakamiya, 243-0198, Atsugi-shi, Japan

    Masatoshi Oda

Authors
  1. Atsushi Yokoo
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  2. Hideo Namatsu
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  3. Masatoshi Oda
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Yokoo, A., Namatsu, H. & Oda, M. Nanoelectrode Lithography. MRS Online Proceedings Library 961, 1001 (2006). https://doi.org/10.1557/PROC-0961-O10-01

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  • DOI: https://doi.org/10.1557/PROC-0961-O10-01

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