Abstract
A thin nanocrystalline Pt interfacial layer (IL) was observed near the SrBi2Ta2O9(SBT)–Pt interface after crystallization treatment in a SBT–Pt–Ti ferroelectric capacitor. Apart from its Pt content, this IL also incorporated large numbers of Ti and O atoms, which arose from the Ti adhesion layer and the SBT film, respectively. These atoms reacted to form TiOx, which resulted in a volume expansion during the annealing process. This phenomenon led to a putative shear stress being exerted on the Pt layer. Under such stress and thermal conditions, we speculate that the nanocrystalline Pt IL developed from the Pt bottom electrode.
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Leu, CC. Nanocrystalline Pt interfacial layer formed by stress in a SrBi2Ta2O9–Pt–Ti ferroelectric capacitor. Journal of Materials Research 22, 1718–1725 (2007). https://doi.org/10.1557/JMR.2007.0207
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DOI: https://doi.org/10.1557/JMR.2007.0207