Abstract
The effect of substrate bias voltage on the properties of arc ion-plated TiN films onto high speed steels has been investigated. The high density structure with a large crystallite size grew at the high bias voltage. TiN films deposited by higher bias exhibited strong preferential (111) orientation from XRD. The internal stress of TiN films increased at first with increasing substrate bias voltage; however, it decreased as the bias voltage increased over 100 V. The coating adhesion measured by the scratch tester increased with increasing bias voltage, and this is coupled with a cohesion of films. Cutting performance of TiN coated drills, which increased markedly with increasing substrate bias, has been studied in relation to the physical and chemical properties of deposited films.
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Yamamoto, S., Ichimura, H. Effect of substrate bias voltage on the properties of arc ion-plated TiN films onto high speed steels. Journal of Materials Research 11, 1149–1156 (1996). https://doi.org/10.1557/JMR.1996.0148
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DOI: https://doi.org/10.1557/JMR.1996.0148