Skip to main content
SpringerLink
Log in

Three-Dimensional Modeling of the High Pressure Organometallic Chemical Vapor Deposition of InN using Trimethylindium and Ammonia

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

A physico-chemical model of the High Pressure Organometallic Chemical Vapor Deposition (HPOMCVD) process that describes three dimensional transport phenomena as well as gas-phase and surface reactions underlying the growth of compound semiconductors is presented. A reduced-order model of the Organometallic Chemical Vapor Deposition of indium nitride (InN) from trimethylindium In(CH3)3 or TMI and ammonia (NH3) at elevated pressures has been developed and tested using the computational fluid dynamics code, CFD-ACE+. The model describes the flow dynamics coupled to chemical reactions and transport in the flow channel of the Compact Hard Shell Reactor, as a function of substrate temperature, total pressure and centerline flow velocity.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. J. MacChesney, P. M. Bridenbough and P. B. O'Connor, Mater. Res. Bull. 5 (1970) 783.

    Article  CAS  Google Scholar 

  2. S. Krukowski, A. Witek, J. Adamczyk, J. Jun, M. Bockowski, I. Grzegory, B. Lucznik, G. Nowak, M. Wroblewski, A. Presz, S. Gierlotka, S. Stelmach, B. Palosz, S. Porowski and P. Zinn, J. Phys. Chem. Solids. 59 (1998) 289.

    Article  CAS  Google Scholar 

  3. K. J. Bachmann, S. McCall, S. LeSure, N. Sukidi and F. Wang, J. of Japan Society of Microgravity Applications, 15 (1998) 436.

    Google Scholar 

  4. CFD-ACE User's Manual, Version 6.4 (CFDRC, Huntsville, AL, USA, 2000).

  5. K. J. Bachmann, H. T. Banks, C. Hopfner, G. M. Kepler, S. LeSure, S. D. McCall, J. S. Scroggs, Mathematical and Computer Modelling, 29 (1999) 65.

    Article  Google Scholar 

  6. N. Dietz, S. McCall, K.J. Bachmann, “Real-time optical monitoring of flow kinetics and gas phase reactions under high-pressure OMCVD conditions”, Proceedings of the Microgravity Conference 2000, Huntsville, AL. June 6-8, NASA/CP-2001-210827, (2001) 176.

  7. R. B. Byrd, W. E. Stewart, E. N. Lightfoot, Transport Phenomena. New York, NY: John Wiley & Sons, 1960.

    Google Scholar 

  8. B. H. Cardelino, C. E. Moore, C. A. Cardelino, D. O. Frazier, and K. J. Bachmann, J. Phys. Chem. A 105 (2000) 849.

    Article  Google Scholar 

  9. N. I. Buchan and J. M. Jasinski, J. of Crystal Growth 106 (1988) 227.

    Article  Google Scholar 

  10. M. G. Jacko and S. J. W. Price, Can. J. chem. 42 (1964) 1198.

    Article  CAS  Google Scholar 

  11. J. Haigh and S. O'Brien, J. Crystal Growth 68 (1984) 550.

    Article  CAS  Google Scholar 

  12. B. H. Cardelino, C. A. Cardelino, D. O. Frazier, A. Krishnan, S. Lowry, C. Moore, N. Zhou, and K. J. Bachmann, Proc. SPIE 3625 (1999) 447.

  13. K. J. Bachmann, B. H. Cardelino, C. E. Moore, C. A. Cardelino, N. Sukidi, and S. McCall, In Situ Process Diagnostics and Modelling. Symposium. Materials Research Society, Warrendale, PA (1999) 59.

  14. R. D. Kenner, F. Rohrer and F. Stuhl, J. Chem. Phys. 86(4) (1987) 2036.

    Article  CAS  Google Scholar 

Download references

Acknowledgments

The authors wish to acknowledge the helpful discussions and input provided by Nikolaus Dietz, Beatriz Cardelino, Craig E. Moore, Sam Lowry, Sandip Mazumder and Ning Zhou in the development of this work. Also, we would like to acknowledge the support of this work by NASA Collaborative Agreement NCC8-95 and NASA Grant NAG8-1686.

Author information

Authors and Affiliations

  1. Dept. of Chemistry, Spelman College, Atlanta, Georgia, 30314, USA

    Sonya D. McCall & Klaus J. Bachmann

  2. North Carolina State University, Raleigh, North Carolina, 27606, USA

    Sonya D. McCall

Authors
  1. Sonya D. McCall
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Klaus J. Bachmann
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

McCall, S.D., Bachmann, K.J. Three-Dimensional Modeling of the High Pressure Organometallic Chemical Vapor Deposition of InN using Trimethylindium and Ammonia. MRS Online Proceedings Library 693, 19–24 (2001). https://doi.org/10.1557/PROC-693-I3.13.1

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/PROC-693-I3.13.1

Search

Navigation