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In situ and Ex situ Applications of Spectroscopic Ellipsometry

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Abstract

We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

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Acknowledgments

The Authors would like to thank Professor George Maracas, Mr. Yale Strausser, Mr. Gerry Cooney, Mr. Duane Meyer, and Professor Mark Schattenburg for their participation in parts of the work reported. Support was received from Intel Corporation, the US Army Night Vision Laboratory, the Advanced Research Projects Agency, and other corporate sponsors.

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Authors and Affiliations

  1. Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE, 68588-0511, USA

    John A. Woollam, Paul G. Snyder, Jeffrey Hale & Huade Walter Yao

  2. JA Woollam Co., Inc., 650 J Street, Lincoln, NE, 68508, USA

    John A. Woollam, Blaine Johs & William A. McGahan

Authors
  1. John A. Woollam
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  2. Blaine Johs
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  3. William A. McGahan
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  4. Paul G. Snyder
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  5. Jeffrey Hale
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  6. Huade Walter Yao
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Woollam, J.A., Johs, B., McGahan, W.A. et al. In situ and Ex situ Applications of Spectroscopic Ellipsometry. MRS Online Proceedings Library 324, 15–25 (1993). https://doi.org/10.1557/PROC-324-15

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  • DOI: https://doi.org/10.1557/PROC-324-15

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