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Investigation into the Thin-Film Fabrication of Intermetallic NiTi

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Abstract

Thin-films of Ni and Ti were formed by sputter co-deposition of Ni and Ti onto amorphous SiO2 and single crystal NaCl and Sapphire substrates. Films were characterized as follows: a) The chemical composition of the films was analysed by EDAX b) The gross morphology was examined by Scanning Electron Microscopy. c) The crystal phases were indentified by X-ray diffraction and Electron diffraction. Intermetallic NiTi has been identified in samples annealed in vacuo at 850°C. Annealing at 500°C in vacuum produced chemical separation of the Ni and Ti. This effect may be due to a narrow solidus region for the existence of NiTi and inhomogeneities due to uneven deposition of the Ni and Ti.

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Acknowledgements

The authors are grateful to the Research Foundation of SUNY Stony Brook for a Grant-in-Aid award. One of us (APJ) would like to acknowledge SUNY Stony Brook for a Travel Grant.

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Authors and Affiliations

  1. Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY, 11793, USA

    A. Peter Jardine, Hong Zhang & Lysa D. Wasielesky

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  1. A. Peter Jardine
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  2. Hong Zhang
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  3. Lysa D. Wasielesky
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Jardine, A.P., Zhang, H. & Wasielesky, L.D. Investigation into the Thin-Film Fabrication of Intermetallic NiTi. MRS Online Proceedings Library 187, 181–186 (1990). https://doi.org/10.1557/PROC-187-181

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  • DOI: https://doi.org/10.1557/PROC-187-181

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