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VHF-GD a-Si:H Films Prepared at Very Low Temperature

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Abstract

Structural, optical and electrical properties of a-Si:H films prepared with the VHF Glow Discharge system were studied as function of deposition temperature, particularly in the range below 100°C. Usually, this material has poor optoelectronic properties. The a-Si:H material discussed in this work shows a surprisingly low hydrogen content, a low dihydride to monohydride ratio, good optical and electrical properties.

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Authors and Affiliations

  1. Institute of Microtechnology, University of Neuchâtel, A.L. Breguet 2, CH-2000, Neuchâtel, Switzerland

    Y. Ziegler, H. Curtins & A. Shah

  2. University of Konstanz, Jacob-Burckhardt-strasse 25–35, D-7750, Konstanz 1, Germany

    J. Baumann

Authors
  1. Y. Ziegler
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  2. H. Curtins
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  3. J. Baumann
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  4. A. Shah
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Ziegler, Y., Curtins, H., Baumann, J. et al. VHF-GD a-Si:H Films Prepared at Very Low Temperature. MRS Online Proceedings Library 149, 81–86 (1989). https://doi.org/10.1557/PROC-149-81

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  • DOI: https://doi.org/10.1557/PROC-149-81

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