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Chemical stability of CVD source materials for high-Tc superconducting films

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Abstract

The stability of chemical vapor deposition (CVD) source materials for high-Tc superconducting films was examined by 1H-NMR (nuclear magnetic resonance), 13C-NMR, IR (infrared) absorption, and TG-DTA (thermogravimetry and differential thermal analysis) measurements. Highly purified Ca(DPM)2 (DPM: dipyvaloylmethane: (CH3)3CCOCHCOC(CH3)3) and Sr(DPM)2, utilizing recrystallization and sublimation, easily decomposed at room temperature and changed their thermal properties when they were handled and stored in air or even in an Ar atmosphere without removing adsorbed species such as water. The stability increased by removing a trace of adsorbed species and storing in an Ar atmosphere at −30 °C. Bi(C6H5)3 and Y(DPM)3 showed higher chemical stability than Ca(DPM)2 and Sr(DPM)2.

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References

  1. H. Koinuma, M. Kawasaki, M. Funabashi, T. Hasegawa, K. Kishio, K. Kitazawa, and K. Fueki, J. Appl. Phys. 62, 1524 (1987).

    Article  CAS  Google Scholar 

  2. J. Kwo, T. C. Hsieh, R. M. Fleming, M. Hong, S. H. Liou, B. A. Davidson, and L. C. Feldman, Phys. Rev. B 64, 4039 (1987).

    Article  Google Scholar 

  3. H. Yamane, M. Hasei, H. Kurosawa, and T. Hirai, Jpn. J. Appl. Phys. 30, L1003 (1991).

    Article  CAS  Google Scholar 

  4. K. Kanehori, N. Sugii, and K. Miyauchi, in High-Temperature Superconductors: Fundamental Properties and Novel Materials Processing, edited by D. Christen, J. Narayan, and L. Schneemeyer (Mater. Res. Soc. Symp. Proc. 169, Pittsburgh, PA, 1990), pp. 589–592.

  5. T. Hashimoto, K. Kitazawa, M. Nakabayashi, T. Shiraishi, Y. Suemune, T. Yamamoto, and H. Koinuma, Appl. Organometallic Chem. 5, 325 (1991).

    Article  CAS  Google Scholar 

  6. T. Hashimoto, K. Kitazawa, Y. Suemune, T. Yamamoto, and H. Koinuma, Jpn. J. Appl. Phys. 29, L2215 (1990).

    Article  CAS  Google Scholar 

  7. S. Ohshima, K. Takahashi, R. Sato, M. Yoshino, and S. Tateno, Extended Abstracts of the 38th Spring Meeting, 28a-ZM-10 (The Japan Society of Applied Physics and Related Societies, Tokyo, 1991).

    Google Scholar 

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Authors and Affiliations

  1. Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, 227, Midori-ku, Yokohama, Japan

    Takuya Hashimoto & Hideomi Koinuma

  2. Department of Communications, Faculty of Engineering, Tokai University, 1117 Kitakaname, 259-12, Hiratsuka, Japan

    Masaaki Nakabayashi & Tadashi Shiraishi

  3. Nihon Kagaku Sangyo Co. Ltd., 80 Nakane-cho, 340, Souka, Japan

    Youichi Suemune

  4. Research Laboratory of Resources Utilization, Tokyo Institute of Technology, 4259 Midori-ku, 227, Nagatsuta, Yokohama, Japan

    Takakazu Yamamoto

Authors
  1. Takuya Hashimoto
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  2. Hideomi Koinuma
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  3. Masaaki Nakabayashi
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  4. Tadashi Shiraishi
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  5. Youichi Suemune
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  6. Takakazu Yamamoto
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Hashimoto, T., Koinuma, H., Nakabayashi, M. et al. Chemical stability of CVD source materials for high-Tc superconducting films. Journal of Materials Research 7, 1336–1340 (1992). https://doi.org/10.1557/JMR.1992.1336

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  • DOI: https://doi.org/10.1557/JMR.1992.1336

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