2005 Volume 125 Issue 1 Pages 69-70
We have developed a precise sub-μm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 μm and a period of 1.59 μm on a 2-μm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.
The transactions of the Institute of Electrical Engineers of Japan.A
The Journal of the Institute of Electrical Engineers of Japan
