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Conferences > OIC > 2013 > ThD > ThD.3

Temperature dependence of the optical absorption in amorphous Ta2O5 and SiO2 dielectric thin films

A. S. Markosyan, R. M. Faris, R. Route, M. M. Fejer, D. Patel, and C. S. Menoni

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Abstract

The intrinsic and induced with 514 nm radiation optical absorption at 1064 nm in Ta2O5 and SiO2 thin films is studied in the temperature range 20 – 630 K.

© 2013 Optical Society of America

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