Analysis of wavefront aberration in a single collimating lens based dual-beam exposure system

Vunam Le; Guanhao Wu; Lijiang Zeng

doi:10.1364/CLEOPR.2020.P4_12

14th Pacific Rim Conference on Lasers and Electro-Optics (CLEO PR 2020)
OSA Technical Digest (Optica Publishing Group, 2020),
paper P4_12
•https://doi.org/10.1364/CLEOPR.2020.P4_12

Analysis of wavefront aberration in a single collimating lens based dual-beam exposure system

Vunam Le, Guanhao Wu, and Lijiang Zeng

Conference on Lasers and Electro-Optics/Pacific Rim 2020

Sydney Australia
3–5 August 2020
ISBN: 978-0-646-82504-5

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Poster Presentations - 4 (P4)

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V. Le, G. Wu, and L. Zeng, "Analysis of wavefront aberration in a single collimating lens based dual-beam exposure system," in 14th Pacific Rim Conference on Lasers and Electro-Optics (CLEO PR 2020), OSA Technical Digest (Optica Publishing Group, 2020), paper P4_12.

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Abstract

We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.

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