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Publicly Available Published by De Gruyter January 1, 2009

Nucleation, growth, and morphology of dust in plasmas

  • Alan Garscadden
From the journal Pure and Applied Chemistry
https://doi.org/10.1351/pac199466061319
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Abstract

Conference

International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, Eleventh, Loughborough, UK, 1993-08-22–1993-08-27

Published Online: 2009-01-01
Published in Print: 1994-01-01

© 2013 Walter de Gruyter GmbH, Berlin/Boston

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From the journal
Pure and Applied Chemistry
Pure and Applied Chemistry
Volume 66 Issue 6
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Journal and Issue

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The chemistry of etching and deposition processes
Mass and optical emission spectroscopy of plasmas for diamond synthesis
Atoms, radicals and ions observed in plasmas - Their gas and surface chemistry
Review of plasma development in the former Soviet Union
The future of thermal plasma processing for coating
Plasma fluidized and spouted bed reactors: An overview
High temperature processing and numerical modelling of thermal plasmas in Norway
Plasma spraying: Present and future
Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
Theoretical basis of non-equilibrium near atmospheric pressure plasma chemistry
Modelling of dielectric barrier discharge chemistry
Theory of electric corona including the role of plasma chemistry
High power plasma arc melting process for incinerated ash contraction
Gliding arc: Applications to engineering and environment control
The reactive sputtering of oxides and nitrides
Nucleation, growth, and morphology of dust in plasmas
Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
Plasma processing techniques used at Caswell
Processing of electronic materials by microwave plasma
Decomposition of gaseous dielectrics (CF4,SF6) by a non-equilibrium plasma. Mechanisms, kinetics, mass spectrometric studies and interactions with polymeric targets
Self consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmas
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
Real-time monitoring of surface chemistry during plasma processing
The fullerenes: Precursors for 21st century materials
Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
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