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Publicly Available Published by De Gruyter January 1, 2009

The chemistry of etching and deposition processes

  • R. d’Agostino , F. Fracassi and R. Lamendola
From the journal Pure and Applied Chemistry
https://doi.org/10.1351/pac199466061185
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Abstract

Conference

International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, Eleventh, Loughborough, UK, 1993-08-22–1993-08-27

Published Online: 2009-01-01
Published in Print: 1994-01-01

© 2013 Walter de Gruyter GmbH, Berlin/Boston

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From the journal
Pure and Applied Chemistry
Pure and Applied Chemistry
Volume 66 Issue 6
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Journal and Issue

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The chemistry of etching and deposition processes
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