ECS Meeting Abstracts

Phenomena of Dielectric Capping Layer Insertion into High- κ Metal Gate Stacks in Gate-First/Gate-Last Integration

Hemanth Jagannathan¹, Paul Jamison¹ and Vamsi Paruchuri¹

© 2012 ECS - The Electrochemical Society
ECS Meeting Abstracts, Volume MA2012-02, E5 - Dielectric Materials and Metals for Nanoelectronics and Photonics 10 Citation Hemanth Jagannathan et al 2012 Meet. Abstr. MA2012-02 2592 DOI 10.1149/MA2012-02/31/2592

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¹ IBM Research

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