The Morphology of Silicon Electrodeposits on Graphite Substrates

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© 1983 ECS - The Electrochemical Society
, , Citation Dennis Elwell et al 1983 J. Electrochem. Soc. 130 1021 DOI 10.1149/1.2119877

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1 Center for Materials Research, Stanford University, Stanford, California 94305

Dates

  1. Received 15 March 1982
  2. Revised 6 October 1982

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Abstract

Silicon electrodeposited on a dense, pyrolytic carbon, and on a graphite with 22% porosity are compared. Deposits with strongly developed <111> texture and apparently free from voids and inclusions can be made on both substrate materials. Deposits on vertical surfaces are normally free from inclusions and voids, in contrast to those on horizontal surfaces, even when the cathode is rotated.

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