Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Films

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© 2007 ECS - The Electrochemical Society
, , Citation Steven George et al 2007 ECS Trans. 11 81 DOI 10.1149/1.2779072

1938-5862/11/7/81

Abstract

Polymeric films can be grown by a sequential, self-limiting surface chemistry process known as molecular layer deposition (MLD) that is very similar to atomic layer deposition (ALD). The MLD reactants are typically monomers for step-wise condensation polymerization and can yield completely organic or hybrid organic-inorganic alloys. This study will illustrate the MLD of organic films with the growth of nylon 66 and poly(p-phenylene terephthalamide) [PPTA]. Hybrid organic-inorganic MLD will also be demonstrated using the growth of poly(aluminum ethylene glycol) [PAEG]. The nylon 66 and PPTA MLD and the PAEG MLD will be examined with in situ transmission Fourier transform infrared (FTIR) spectroscopy, in situ quartz crystal microbalance (QCM) and ex situ x-ray reflectivity (XRR) measurements. These investigations will reveal the self-limiting chemistry and linear growth expected for MLD processing.

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10.1149/1.2779072